TY  - JOUR 
AU  - Aboy Cebrián, María
AU  - Santos Tejido, Iván
AU  - Pelaz Montes, María Lourdes
AU  - Marqués Cuesta, Luis Alberto
AU  - López Martín, Pedro
PY  - 2014
SN  - 1569-8025
UR  - http://uvadoc.uva.es/handle/10324/28620
AB  - Ion implantation is a very well established technique to introduce dopants in semiconductors. This technique has been traditionally used for junction formation in integrated circuit processing, and recently also in solar cells fabrication. In any...
LA  - eng
PB  - Springer Verlag
KW  - Silicon
TI  - Modeling of defects, dopant diffusion and clustering in silicon
DO  - 10.1007/s10825-013-0512-5
ER  -