TY  - JOUR 
AU  - Landesman, Jean-Pierre
AU  - Jiménez López, Juan Ignacio
AU  - Levallois, Christophe
AU  - Pommereau, Frédéric
AU  - Frigeri, Cesare
AU  - Torres, Alfredo
AU  - Le Ger, Yoan
AU  - Beck, Alexandre
AU  - Rhallabi, Ahmed
PY  - 2016
SN  - 0734-2101
UR  - http://uvadoc.uva.es/handle/10324/21758
AB  - The general objective is the investigation of the defects formed by dry etching tools such as those involved in the fabrication of photonic devices with III–V semiconductors. Emphasis is put on plasma exposures with chlorine-based chemistries. In...
LA  - eng
PB  - AIP Publishing
KW  - Quantum wells
TI  - Defect formation during chlorine-based dry etching and their effects on the electronic and structural properties of InP/InAsP quantum wells
DO  - 10.1116/1.4950445
ER  -