TY  - JOUR 
AU  - Marqués Cuesta, Luis Alberto
AU  - Santos Tejido, Iván
AU  - Pelaz Montes, María Lourdes
AU  - López Martín, Pedro
AU  - Aboy Cebrián, María
PY  - 2015
UR  - http://uvadoc.uva.es/handle/10324/28015
AB  - Requirements for the manufacturing of electronic devices at the nanometric scale are becoming more and more demanding on each new technology node, driving the need for the fabrication of ultra-shallow junctions and finFET structures. Main implantation...
LA  - eng
PB  - Elsevier
KW  - Atomistic simulation
KW  - Multi-scale schemes
KW  - Silicio
TI  - Atomistic modeling of ion implantation technologies in silicon
DO  - https://doi.org/10.1016/j.nimb.2014.11.105
ER  -