TY  - THES 
A3  - Rey Martínez, Francisco Javier
AU  - Amo Iglesias, Lidia
PY  - 2018
UR  - http://uvadoc.uva.es/handle/10324/31198
AB  - Hydrogenated amorphous silicon thin films have been prepared using the Plasma Enhanced Chemical Vapor Deposition (13.56 MHz PECVD) technique over two kinds of substrate, boro-silicate glass and double-sided polished silicon wafers. The films were...
LA  - eng
KW  - Silicio - Aplicaciones industriales
KW  - Semiconductores
TI  - Production of amorphous silicon thin films using Chemical Vapour Deposition
M3  - info:eu-repo/semantics/bachelorThesis
ER  -