Electrical and magnetic properties of atomic layer deposited cobalt oxide and zirconium oxide nanolaminates

Kalam, Kristjan; Seemen, Helina; Mikkor, Mats; Jõgiaas, Taivo; Ritslaid, Peeter; Tamm, Aile; Kukli, Kaupo; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Dueñas Carazo, Salvador; Castán Lanaspa, María Helena

doi:10.1016/j.tsf.2018.11.008

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Título

Electrical and magnetic properties of atomic layer deposited cobalt oxide and zirconium oxide nanolaminates

Autor

Dueñas Carazo, Salvador

Castán Lanaspa, María Helena

Año del Documento

2019

Editorial

Elvier

Descripción

Producción Científica

Documento Fuente

Thin Solid Films Volume 669, 2019, Pages 294-300

Zusammenfassung

Nanolaminates of ZrO2 and Co3O4 were atomic layer deposited on silicon and titanium nitride at 300 °C. Films were confirmed to be polycrystalline in the as-deposited state, with the cubic phase dominating in both oxides. All films exhibited resistive switching characteristics and charge polarization and ferromagnetic behavior. Also, the relative permittivities of the films were measured and the dispersion functions modelled.

Materias Unesco

2202 Electromagnetismo

Palabras Clave

Óxido de cobalto

Cobalt oxide

ISSN

0040-6090

Revisión por pares

DOI

10.1016/j.tsf.2018.11.008

Patrocinador

Ministerio de Economía, Industria y Competitividad (TEC2017-84321-C4-2-R)