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Título
Atomistic modeling of high energy irradiation in semiconductors
Autor
Cobertura temporal
start 2021-09-01; end 2025-08-31
Año del Documento
2026
Abstract
This project aims to develop atomistic models based on physical mechanisms that are predictive and computationally efficient for simulating high-energy irradiation processes in semiconductors. In particular, irradiation with very high-energy neutrons and protons (MeV-GeV) is an inevitable process in devices operating in highly radioactive environments (radiation sensors, nuclear facilities, medical radiological equipment, etc.), causing a loss of performance and a reduction in their lifespan.
We have established a multi-scale atomistic simulation methodology combining the Geant4 – BCA – kMC techniques, which allows us to obtain the spectrum of recoils produced by a given irradiation (particle type and energy), simulate their interaction with the semiconductor, and their effect on the activation of dopants.
This Dataset includes the spectrum of PKAs resulting from neutron and proton irradiation in Si obtained with Geant4, the analysis of defects produced by low energy Si recoils as simulated by MD and BCA techniques, and the simulation with the kMC code DADOS of dopant deactivation (acceptor removal process) in p-type Si sensors induced by neutron an proton irradiation.
Contiene
INDEX
1. GENERAL INFORMATION
1.1 Title of Dataset
1.2 Authorship
1.2.1 IPs
1.2.2 Researchers
1.3 Research group
1.4 Institution
2. DESCRIPTION
2.1 Dataset language
2.2 Abstract
2.3 Keywords
2.4 Date of data collection
2.5 Date of dataset publication
2.6 Funding
2.7 Geographic location/s of data collection
3. ACCESS INFORMATION
3.1 Dataset Creative Commons License
3.2 Dataset DOI
3.3 Related publication
4. METHODOLOGICAL INFORMATION
4.1 Description of methods used for collection-generation of data
5. DATA
5.1 File List
5.2 Last update
Materias Unesco
2211.25 Semiconductores
3307.91 Microelectrónica. Tecnología del Silicio
Palabras Clave
high energy irradiation
atomistic simulation
modeling
defects
semiconductor
acceptor removal
dopants
Cobertura espacial
The data (simulations results) were generated at the Department of Electricity and Electronics, University of Valladolid, Valladolid (Spain)
Departamento
Multiscale Materials Modeling Group
GIR de Electrónica
Departamento de Electricidad y Electrónica
GIR de Electrónica
Departamento de Electricidad y Electrónica
Patrocinador
Spanish Ministerio de Ciencia e Innovación under Project No. PID2020-115118GB-I00
Idioma
eng
Tipo de versión
info:eu-repo/semantics/updatedVersion
Derechos
openAccess
Está basado en
The Dataset generated in this research project is based on the atomistic simulations performed during the project.
Es referenciado por
Microscopic origin of the acceptor removal in neutron-irradiated Si detectors - An atomistic simulation study (https://doi.org/10.1016/j.actamat.2022.118375)
Atomistic simulations of acceptor removal in p-type Si irradiated with neutrons (https://doi.org/10.1016/j.nimb.2021.12.003)
Atomistic simulations of acceptor removal in p-type Si irradiated with neutrons (https://doi.org/10.1016/j.nimb.2021.12.003)
Collections
- Datasets [102]
Files in this item
Tamaño:
277.3Kb
Formato:
Hoja Excel
Descripción:
Excel file containing the data
Except where otherwise noted, this item's license is described as Attribution-NonCommercial-NoDerivatives 4.0 Internacional











