2026-04-27T08:16:33Zhttps://uvadoc.uva.es/oai/request

oai:uvadoc.uva.es:10324/446652021-06-24T07:23:18Zcom_10324_43510com_10324_954com_10324_894col_10324_43513

Kukli, Kaupo Kemell, Marianna Castán Lanaspa, María Helena Dueñas Carazo, Salvador Seemen, Helina Rähn, Mihkel Link, Joosep Stern, Raivo Ritala, Mikko Leskelä, Markku 2018 Producción Científica Nanocrystalline HfO2:Al2O3 mixture films and nanolaminates were grown by atomic layer deposition at 350°C from metal chloride precursors and water. Formation of metastable HfO2 polymorphs versus monoclinic phase was affected by the relative amount and thickness of constituent oxide layers. The films exhibited saturative magnetization and charge polarization in externally applied fields at room temperature. The films also demonstrated resistive switching behavior with considerable window between low and high resistance states. application/pdf http://uvadoc.uva.es/handle/10324/44665 eng IOP Publishing Atomic layer deposition and properties of HfO2-Al2O3 nanolaminates info:eu-repo/semantics/article TEXT UVaDOC. Repositorio Documental de la Universidad de Valladolid Hispana