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oai:uvadoc.uva.es:10324/451712021-06-24T07:23:41Zcom_10324_43510com_10324_954com_10324_894col_10324_43513

Seemen, Helina Kukli, Kaupo Jõgiaas, Taivo Ritslaid, Peeter Link, Joosep Stern, Raivo Dueñas Carazo, Salvador Castán Lanaspa, María Helena Tamm, Aile 2021-02-01T10:20:10Z 2021-02-01T10:20:10Z 2020 Journal of Alloys and Compounds Volume 846, 2020, 156099 0925-8388 http://uvadoc.uva.es/handle/10324/45171 10.1016/j.jallcom.2020.156099 156099 Journal of Alloys and Compounds 846 Producción Científica Two-component crystalline thin film structures consisting of continuous ε-Fe2O3 bottom layers followed by top layers of BiOCl nanoflakes were grown using atomic layer deposition from FeCl3 and BiCl3 at 375 °C. Si(100) planar wafer, three-dimensional Si structures and conductive TiN/Si were exploited as substrates. Electrical measurements revealed that the deposited structures were moderately leaky, as the structures showed rectifying behavior affected by visible illumination. Magnetization in these films in the as-deposited state was nonlinear, saturative, and exhibited well-defined coercive fields. Annealing changed the surface morphology, phase composition and reduced the magnetic behavior of the thin films. Ministerio de Economía, Industria y Competitividad (TEC2017-84321-C4-2-R) application/pdf eng Elsevier Elsevier info:eu-repo/semantics/openAccess http://creativecommons.org/licenses/by-nc-nd/4.0/ © 2020 Elsevier Attribution-NonCommercial-NoDerivatives 4.0 Internacional Properties of atomic layer deposited iron oxide and bismuth oxide chloride structures info:eu-repo/semantics/article info:eu-repo/semantics/acceptedVersion https://www.sciencedirect.com/science/article/pii/S0925838820324634?dgcid=rss_sd_all SI