2026-04-27T22:04:36Zhttps://uvadoc.uva.es/oai/request
oai:uvadoc.uva.es:10324/451712021-06-24T07:23:41Zcom_10324_43510com_10324_954com_10324_894col_10324_43513
UVaDOC author Seemen, Helina author Kukli, Kaupo author Jõgiaas, Taivo author Ritslaid, Peeter author Link, Joosep author Stern, Raivo author Dueñas Carazo, Salvador author Castán Lanaspa, María Helena author Tamm, Aile 2021-02-01T10:20:10Z 2021-02-01T10:20:10Z 2020 Journal of Alloys and Compounds Volume 846, 2020, 156099 0925-8388 http://uvadoc.uva.es/handle/10324/45171 10.1016/j.jallcom.2020.156099 156099 Journal of Alloys and Compounds 846 Two-component crystalline thin film structures consisting of continuous ε-Fe2O3 bottom layers followed by top layers of BiOCl nanoflakes were grown using atomic layer deposition from FeCl3 and BiCl3 at 375 °C. Si(100) planar wafer, three-dimensional Si structures and conductive TiN/Si were exploited as substrates. Electrical measurements revealed that the deposited structures were moderately leaky, as the structures showed rectifying behavior affected by visible illumination. Magnetization in these films in the as-deposited state was nonlinear, saturative, and exhibited well-defined coercive fields. Annealing changed the surface morphology, phase composition and reduced the magnetic behavior of the thin films. eng Attribution-NonCommercial-NoDerivatives 4.0 Internacional Properties of atomic layer deposited iron oxide and bismuth oxide chloride structures info:eu-repo/semantics/article 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URL https://uvadoc.uva.es/bitstream/10324/45171/1/Revised_JALCOM-D-20-05860_Seemen.pdf File MD5 042b36e25ad1d8f4700f2d632e7eb9d2 2609442 application/pdf Revised_JALCOM-D-20-05860_Seemen.pdf