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<title>Study of the set and reset transitions in HfO2-based ReRAM devices using a capacitor discharge</title>
<creator>García García, Héctor</creator>
<creator>Vinuesa Sanz, Guillermo</creator>
<creator>González Ossorio, Óscar</creator>
<creator>Sahelices Fernández, Benjamín</creator>
<creator>Castán Lanaspa, María Helena</creator>
<creator>Dueñas Carazo, Salvador</creator>
<creator>Bargalló González, Mireia</creator>
<creator>Campabadal Segura, Francesca</creator>
<description>Producción Científica</description>
<description>In  this  work,  we  have  studied  the  set  and  the  reset  transitions  in  hafnium  oxide-based &#xd;
metal-insulator-metal ReRAM devices using a capacitor discharge. Instead of applying a &#xd;
conventional  voltage  or  current  signal,  we  have  discharged  a  capacitor  through  the &#xd;
devices  to  perform  both  transitions.  In  this  way,  both  transitions  are  shown  to  be &#xd;
controllable.  An  accumulative  process  is  observed  if  we  apply  consecutive  discharges, &#xd;
and, when increasing the capacitor voltage in each discharge, the transitions between both &#xd;
resistance states are complete. In addition, it has been shown that faster transitions require larger capacitor voltages.</description>
<date>2021-09-13</date>
<date>2021-09-13</date>
<date>2021</date>
<type>info:eu-repo/semantics/article</type>
<identifier>Solid-State Electronics, 2021, vol. 183, p. 108113</identifier>
<identifier>0038-1101</identifier>
<identifier>https://uvadoc.uva.es/handle/10324/48639</identifier>
<identifier>10.1016/j.sse.2021.108113</identifier>
<identifier>108113</identifier>
<identifier>Solid-State Electronics</identifier>
<identifier>183</identifier>
<language>eng</language>
<relation>https://www.sciencedirect.com/science/article/pii/S0038110121001568</relation>
<rights>info:eu-repo/semantics/openAccess</rights>
<rights>© 2021 Elsevier</rights>
<publisher>Elsevier</publisher>
</thesis></metadata></record></GetRecord></OAI-PMH>