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<dc:creator>Martín Encinar, Luis</dc:creator>
<dc:creator>Santos Tejido, Iván</dc:creator>
<dc:creator>López Martín, Pedro</dc:creator>
<dc:creator>Marqués Cuesta, Luis Alberto</dc:creator>
<dc:creator>Aboy Cebrián, María</dc:creator>
<dc:creator>Pelaz Montes, María Lourdes</dc:creator>
<dc:date>2019</dc:date>
<dc:description>Producción Científica</dc:description>
<dc:description>We used classical molecular dynamics simulations to reproduce basic properties of Si, Ge and SiGe using different empirical potentials available in the literature. The empirical potential that offered the better compromise with experimental data was used to study the surface stability of these materials. We considered the (100), (100)2×1 and (111) surfaces, and we found the processing temperature range to avoid the structural degradation of studied surfaces.</dc:description>
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<dc:language>eng</dc:language>
<dc:publisher>Institute of Electrical and Electronics Engineers (IEEE).</dc:publisher>
<dc:title>Modeling SiGe through classical molecular dynamics simulations: chasing an appropriate empirical potential</dc:title>
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<dcterms:alternative>Spanish Conference on Electron Devices (CDE 2018)</dcterms:alternative>
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