2024-03-28T20:28:43Zhttps://uvadoc.uva.es/oai/requestoai:uvadoc.uva.es:10324/449222021-06-24T07:23:35Zcom_10324_43510com_10324_954com_10324_894col_10324_43513
Kukli, Kaupo
Kemell, Marianna
Castán Lanaspa, María Helena
Dueñas Carazo, Salvador
Seemen, Helina
Rähn, Mihkel
Link, Joosep
Stern, Raivo
Heikkilä, Mikko J.
Ritala, Mikko
Leskelä, Markku
2018
Producción Científica
Thin mixed and nanolaminate films of ZrO2 and Al2O3 were grown by atomic layer deposition from the corresponding metal chlorides and water. The films were grown at 350°C in order to ensure ZrO2 crystallization in the as-deposited state. The relative thicknesses of layers in the structure of the nanolaminates were controlled in order to maximize the content of metastable polymorphs of ZrO2 that have higher permittivity than that of the stable monoclinic ZrO2. The multilayer films demonstrated interfacial charge polarization and saturative magnetization in external fields. The conductivity of the films could be switched between high and low resistance states by applying voltages of alternating polarity.
application/pdf
http://uvadoc.uva.es/handle/10324/44922
eng
IOP Publishing
Atomic layer deposition and performance of ZrO2-Al2O3 thin films
info:eu-repo/semantics/article
TEXT
UVaDOC. Repositorio Documental de la Universidad de Valladolid
Hispana