2024-03-28T17:02:45Zhttps://uvadoc.uva.es/oai/requestoai:uvadoc.uva.es:10324/447052021-06-24T07:23:31Zcom_10324_43510com_10324_954com_10324_894col_10324_43513
Structure and behavior of ZrO2-graphene-ZrO2 stacks
Kahro, Tauno
Castán Lanaspa, María Helena
Dueñas Carazo, Salvador
Merisalu, Joonas
Kozlova, Jekaterina
Jõgiaas, Taivo
Piirsoo, Helle-Mai
Kasikov, Aarne
Ritslaid, Peeter
Mändar, Hugo
Tarre, Aivar
Tamm, Aile
Kukli, Kaupo
Atomic layer deposition
Deposición atómica de capas
Nanomaterials
Nanomaterials
Thin films
Láminas delgadas
Graphene
Grafeno
Producción Científica
ZrO2-graphene-ZrO2 layered structures were built and their crystallinity was characterized before resistive switching measurements. Thin nanocrystalline ZrO2 dielectric films were grown by atomic layer deposition on chemical vapor deposited graphene. Graphene was transferred, prior to the growth of the ZrO2 overlayer, to the ZrO2 film pre-grown on titanium nitride. Nucleation and growth of the top ZrO2 layer was improved after growing an amorphous Al2O3 interface layer on graphene at lowered temperatures. Studies on resistive switching in such structures revealed that the exploitation of graphene interlayers could modify the operational voltage ranges and somewhat increase the ratio between high and low resistance states.
Fondo Europeo de Desarrollo Regional (project TK134)
Estonian Research Agency (grants PRG753 and PRG4)
Ministerio de Economía, Industria y Competitividad (grant TEC2017-84321-C4-2-R)
2021-01-11T13:13:29Z
2021-01-11T13:13:29Z
2020
info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
Journal of Vacuum Science & Technology A, 2020, vol. 38, n. 6. 10 p.
1520-8559
http://uvadoc.uva.es/handle/10324/44705
10.1116/6.0000390
eng
https://avs.scitation.org/doi/10.1116/6.0000390
Attribution-NonCommercial-NoDerivatives 4.0 Internacional
info:eu-repo/semantics/openAccess
http://creativecommons.org/licenses/by-nc-nd/4.0/
© 2020 AIP Publishing
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http://creativecommons.org/licenses/by-nc-nd/4.0/
UVaDOC. Repositorio Documental de la Universidad de Valladolid
http://uvadoc.uva.es/handle/10324/44705