2024-03-28T21:49:38Zhttps://uvadoc.uva.es/oai/requestoai:uvadoc.uva.es:10324/466002021-06-24T07:23:55Zcom_10324_43510com_10324_954com_10324_894col_10324_43513
Hafnium oxide/graphene/hafnium oxide-stacked nanostructures as resistive switching media
Kahro, Tauno
Tarre, Aivar
Käämbre, Tanel
Piirsoo, Helle-Mai
Kozlova, Jekaterina
Ritslaid, Peeter
Kasikov, Aarne
Jõgiaas, Taivo
Vinuesa Sanz, Guillermo
Dueñas Carazo, Salvador
Castán Lanaspa, María Helena
Tamm, Aile
Kukli, Kaupo
Graphene
Grafeno
Atomic layer deposition
Deposición atómica de capas
Hafnium oxide
Óxido de hafnio
Stacked nanostructures
Nanoestructuras apiladas
Producción Científica
Thin HfO2 films were grown by atomic layer deposition on chemical vapor-deposited large-area graphene. The graphene was transferred, prior to the deposition of the HfO2 overlayer, to the HfO2 bottom dielectric layer pregrown on the Si/TiN substrate. Either HfCl4 or Hf[N(CH3)(C2H5)]4 was used as the metal precursor for the bottom layer. The O2 plasma-assisted process was applied for growing HfO2 from Hf[N(CH3)(C2H5)]4 also on the top of graphene. To improve graphene transfer, the effects of the surface pretreatments of the as-grown and aged Si/TiN/HfO2 substrates were studied and compared. The graphene layer retained its integrity after the plasma processes. Studies on resistive switching on HfO2-graphene-HfO2 nanostructures revealed that the operational voltage ranges in the graphene-HfO2 stacks were modified together with the ratios between high- and low-resistance states.
Fondo Europeo de Desarrollo Regional (projects TK134 and TK141)
Ministerio de Economía, Industria y Competitividad (project TEC2017-84321-C4-2-R)
Estonian Research Agency (projects PRG4 and PRG753)
2021-05-14T10:52:55Z
2021-05-14T10:52:55Z
2021
info:eu-repo/semantics/article
info:eu-repo/semantics/acceptedVersion
https://doi.org/10.1021/acsanm.1c00587
ACS Applied Nano Materials, 2021. In press. 12 p.
2574-0970
http://uvadoc.uva.es/handle/10324/46600
eng
https://pubs.acs.org/doi/10.1021/acsanm.1c00587
Attribution-NonCommercial-NoDerivatives 4.0 Internacional
info:eu-repo/semantics/openAccess
http://creativecommons.org/licenses/by-nc-nd/4.0/
© 2021 ACS Publications
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