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oai:uvadoc.uva.es:10324/453972023-04-12T10:57:57Zcom_10324_43510com_10324_954com_10324_894col_10324_43513

García García, Héctor 93750612bc979894 500 0000-0003-1329-8806 Bargalló González, Mireia 9a025c41-6152-4fed-9773-dd56c1af8da8 600 Mallol, M. M. 3db057cf-f39f-4324-8cec-491ae659e32a 500 Castán Lanaspa, María Helena 4cef05d647825969 500 0000-0002-3874-721X Dueñas Carazo, Salvador 63f5c1167ffd429a 500 0000-0002-2328-1752 Campabadal Segura, Francesca c425b127-ea76-49d1-b4ee-2908eae16e93 500 Acero, M. C. e70dd558-4c5a-4006-af06-3635deb4e699 500 Sambuco Salomone, L. 9f501883-e25a-4e95-a800-4494b20e1fdc 500 Faigón, A. 1d049248-3f52-43ea-abcb-2d09470f93d8 500 2021-02-25T13:14:32Z 2021-02-25T13:14:32Z 2018 Journal of Electronic Materials, 2018, vol. 47. p. 5013-5018 0361-5235 http://uvadoc.uva.es/handle/10324/45397 10.1007/s11664-018-6257-y Producción Científica The γ-radiation effects on the electrical characteristics of metal–insulator-semiconductor capacitors based on HfO2, and on the resistive switching characteristics of the structures have been studied. The HfO2 was grown directly on silicon substrates by atomic layer deposition. Some of the capacitors were submitted to a γ ray irradiation using three different doses (16 kGy, 96 kGy and 386 kGy). We studied the electrical characteristics in the pristine state of the capacitors. The radiation increased the interfacial state densities at the insulator/semiconductor interface, and the slow traps inside the insulator near the interface. However, the leakage current is not increased by the irradiation, and the conduction mechanism is Poole–Frenkel for all the samples. The switching characteristics were also studied, and no significant differences were obtained in the performance of the devices after having been irradiated, indicating that the fabricated capacitors present good radiation hardness for its use as a RS element. Ministerio de Economía, Ciencia y Competitividad - Fondo Europeo de Desarrollo Regional (projects TEC2014- 52512-C3-3-R, TEC2014-52512-C3-1-R and TEC2014-54906-JIN) application/pdf eng Springer Link info:eu-repo/semantics/openAccess http://creativecommons.org/licenses/by-nc-nd/4.0/ © 2018 Springer Attribution-NonCommercial-NoDerivatives 4.0 Internacional Hafnium oxide Óxido de hafnio Resistive memories Memorias resistivas Electrical characterization of defects created by γ-radiation in HfO2-based MIS structures for RRAM applications info:eu-repo/semantics/article info:eu-repo/semantics/acceptedVersion https://link.springer.com/article/10.1007%2Fs11664-018-6257-y SI THUMBNAIL Electrical-characterization-of-defects.pdf.jpg Electrical-characterization-of-defects.pdf.jpg IM Thumbnail image/jpeg 4289 https://uvadoc.uva.es/bitstream/10324/45397/4/Electrical-characterization-of-defects.pdf.jpg 3fae8bdaf0bb8c15034db63717059e54 MD5 4 LICENSE license.txt license.txt text/plain 3926 https://uvadoc.uva.es/bitstream/10324/45397/3/license.txt 017313583e37a1e4d1253e1ef6c66c6c MD5 3 CC-LICENSE license_rdf license_rdf application/rdf+xml; charset=utf-8 817 https://uvadoc.uva.es/bitstream/10324/45397/2/license_rdf 975848b171c53b753f7e445c8b5bc0e1 MD5 2 ORIGINAL Electrical-characterization-of-defects.pdf Electrical-characterization-of-defects.pdf application/pdf 1301316 https://uvadoc.uva.es/bitstream/10324/45397/1/Electrical-characterization-of-defects.pdf ac1d01cfcea21b2ec9095321b2d974de MD5 1 10324/45397 oai:uvadoc.uva.es:10324/45397 2023-04-12 12:57:57.966 UVaDOC repositorio@uva.es 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