RT info:eu-repo/semantics/article
T1 Properties of atomic layer deposited nanolaminates of zirconium and cobalt oxides
A1 Seemen, Helina
A1 Rähn, Mihkel
A1 Kalam, Kristjan
A1 Sajavaara, Timo
A1 Dueñas Carazo, Salvador
A1 Castán Lanaspa, María Helena
A1 Link, Joosep
A1 Stern, Raivo
A1 Kukli, Kaupo
A1 Tamm, Aile
K1 Metal oxides
K1 Óxidos metálicos
K1 Nanolaminates
K1 Nanoláminas
AB Five-layer crystalline thin film structures were formed, consisting of ZrO2 and Co3O4 alternately grown on Si(100) substrates by atomic layer deposition at 300°C using ZrCl4 and Co(acac)3 as the metal precursors and ozone as the oxygen precursor. The performance of the laminate films was dependent on the relative content of constituent oxide layers. The magnetization in these films was nonlinear, saturative, and with very weak coercive fields. Electrical measurements revealed the formation of significant polarization versus external field loops and implied some tendency toward memristive behavior.
PB IOP Publishing
SN 2162-8777
YR 2018
FD 2018
LK http://uvadoc.uva.es/handle/10324/44656
UL http://uvadoc.uva.es/handle/10324/44656
LA eng
NO ECS Journal of Solid State Science and Technology, 2018, vol. 7, n. 8. p. 402-409
NO Producción Científica
DS UVaDOC
RD 22-dic-2024