RT info:eu-repo/semantics/article
T1 Electrical and magnetic properties of atomic layer deposited cobalt oxide and zirconium oxide nanolaminates
A1 Kalam, Kristjan
A1 Seemen, Helina
A1 Mikkor, Mats
A1 Jõgiaas, Taivo
A1 Ritslaid, Peeter
A1 Tamm, Aile
A1 Kukli, Kaupo
A1 Kasikov, Aarne
A1 Link, Joosep
A1 Stern, Raivo
A1 Dueñas Carazo, Salvador
A1 Castán Lanaspa, María Helena
K1 Óxido de cobalto
K1 Cobalt oxide
K1 2202 Electromagnetismo
AB Nanolaminates of ZrO2 and Co3O4 were atomic layer deposited on silicon and titanium nitride at 300 °C. Films were confirmed to be polycrystalline in the as-deposited state, with the cubic phase dominating in both oxides. All films exhibited resistive switching characteristics and charge polarization and ferromagnetic behavior. Also, the relative permittivities of the films were measured and the dispersion functions modelled.
PB Elvier
SN 0040-6090
YR 2019
FD 2019
LK http://uvadoc.uva.es/handle/10324/45168
UL http://uvadoc.uva.es/handle/10324/45168
LA eng
NO Thin Solid Films Volume 669, 2019, Pages 294-300
NO Producción Científica
DS UVaDOC
RD 21-dic-2024