RT info:eu-repo/semantics/article
T1 Properties of atomic layer deposited iron oxide and bismuth oxide chloride structures
A1 Seemen, Helina
A1 Kukli, Kaupo
A1 Jõgiaas, Taivo
A1 Ritslaid, Peeter
A1 Link, Joosep
A1 Stern, Raivo
A1 Dueñas Carazo, Salvador
A1 Castán Lanaspa, María Helena
A1 Tamm, Aile
AB Two-component crystalline thin film structures consisting of continuous ε-Fe2O3 bottom layers followed by top layers of BiOCl nanoflakes were grown using atomic layer deposition from FeCl3 and BiCl3 at 375 °C. Si(100) planar wafer, three-dimensional Si structures and conductive TiN/Si were exploited as substrates. Electrical measurements revealed that the deposited structures were moderately leaky, as the structures showed rectifying behavior affected by visible illumination. Magnetization in these films in the as-deposited state was nonlinear, saturative, and exhibited well-defined coercive fields. Annealing changed the surface morphology, phase composition and reduced the magnetic behavior of the thin films.
PB Elsevier
SN 0925-8388
YR 2020
FD 2020
LK http://uvadoc.uva.es/handle/10324/45171
UL http://uvadoc.uva.es/handle/10324/45171
LA eng
NO Journal of Alloys and Compounds Volume 846, 2020, 156099
NO Producción Científica
DS UVaDOC
RD 24-abr-2024