RT info:eu-repo/semantics/article
T1 Electrical and magnetic properties of atomic layer deposited cobalt oxide and iron oxide stacks
A1 Kalam, Kristjan
A1 Rammula, Raul
A1 Kozlova, Jekaterina
A1 Käämbre, Tanel
A1 Ritslaid, Peeter
A1 Kasikov, Aarne
A1 Tamm, Aile
A1 Link, Joosep
A1 Stern, Raivo
A1 Vinuesa, Guillermo
A1 Dueñas, Salvador
A1 Castán, Helena
A1 Kukli, Kaupo
AB Cobalt and iron oxides, due to their tunable structural and magnetic properties, are widely studied for electronic and spintronic applications. However, achieving high coercivity and saturation magnetization in ultrathin films remains a challenge. In this work, we report on the atomic layer deposition (ALD) of nanolaminates and mixed cobalt–iron oxide films on silicon and TiN substrates at 300–450 °C. Using supercycle and multistep ALD methods with ferrocene and cobalt acetylacetonate precursors, we synthesized Co3O4–Fe2O3 bilayers and ternary ferrites (Co2FeO4 and CoFe2O4). The structural, morphological, electrical, and magnetic properties were characterized. We observed that thin films (∼7–12 nm) exhibit markedly enhanced breakdown fields and exceptional magnetic coercivity (up to 25 kOe) and saturation magnetization (up to 1000 emu cm−3), especially after annealing. These results demonstrate a viable route to engineer ferrite-based thin films with superior magnetic and dielectric performance at nanoscale thicknesses.
PB Royal Society of Chemistry
SN 2050-7526
YR 2025
FD 2025
LK https://uvadoc.uva.es/handle/10324/82525
UL https://uvadoc.uva.es/handle/10324/82525
LA spa
NO Journal of Materials Chemistry C, 2025, 13, 17551-17565
NO Producción Científica
DS UVaDOC
RD 06-feb-2026