TY  - JOUR 
AU  - Pelaz Montes, María Lourdes
AU  - Marqués Cuesta, Luis Alberto
AU  - Aboy Cebrián, María
AU  - López Martín, Pedro
AU  - Santos Tejido, Iván
PY  - 2017
UR  - http://uvadoc.uva.es/handle/10324/28012
AB  - We review atomistic modeling approaches for issues related to ion implantation and annealing in advanced device processing. We describe how models have been upgraded to capture physical mechanisms in more detail as a response to the accuracy demanded...
LA  - eng
PB  - Elsevier
KW  - Silicon
KW  - Ion implantation
KW  - Silicio
KW  - Implantación de iones
TI  - Improved physical models for advanced silicon device processing
DO  - https://doi.org/10.1016/j.mssp.2016.11.007
ER  -