TY  - JOUR 
AU  - Kukli, Kaupo
AU  - Kemell, Marianna
AU  - Castán Lanaspa, María Helena
AU  - Dueñas Carazo, Salvador
AU  - Seemen, Helina
AU  - Rähn, Mihkel
AU  - Link, Joosep
AU  - Stern, Raivo
AU  - Ritala, Mikko
AU  - Leskelä, Markku
PY  - 2018
SN  - 2162-8777
UR  - http://uvadoc.uva.es/handle/10324/44665
AB  - Nanocrystalline HfO2:Al2O3 mixture films and nanolaminates were grown by atomic layer deposition at 350°C from metal chloride precursors and water. Formation of metastable HfO2 polymorphs versus monoclinic phase was affected by the relative amount and...
LA  - eng
PB  - IOP Publishing
KW  - Metal oxides
KW  - Óxidos metálicos
KW  - Nanolaminates
KW  - Nanoláminas
KW  - Atomic layer deposition
KW  - Deposición atómica de capas
TI  - Atomic layer deposition and properties of HfO2-Al2O3 nanolaminates
DO  - 10.1149/2.0261809jss
ER  -