TY  - JOUR 
AU  - Kukli, Kaupo
AU  - Kemell, Marianna
AU  - Heikkilä, Mikko J
AU  - Castán Lanaspa, María Helena
AU  - Dueñas Carazo, Salvador
AU  - Mizohata, Kenichiro
AU  - Ritala, Mikko
AU  - Leskelä, Markku
PY  - 2020
SN  - 0957-4484
UR  - http://uvadoc.uva.es/handle/10324/45172
AB  - Amorphous SiO2–Nb2O5 nanolaminates and mixture films were grown by atomic layer deposition. The films were grown at 300 °C from Nb(OC2H5)5, Si2(NHC2H5)6, and O3 to thicknesses ranging from 13 to 130 nm. The niobium to silicon atomic ratio was varied...
LA  - eng
PB  - IOP Publishing
KW  - Deposición de capa atómica
KW  - Atomic layer deposition
TI  - Silicon oxide-niobium oxide mixture films and nanolaminates grown by atomic layer deposition from niobium pentaethoxide and hexakis(ethylamino) disilane
DO  - 10.1088/1361-6528/ab6fd6
ER  -