TY  - JOUR 
AU  - Landesman, Jean-Pierre
AU  - Fouchier, Marc
AU  - Pargon, Erwine
AU  - Gérard, Solène
AU  - Rochat, Névine
AU  - Levallois, Christophe
AU  - Mokhtari, Merwan
AU  - Pagnod-Rossiaux, Philippe
AU  - Laruelle, Francois
AU  - Petit-Etienne, Camille
AU  - Bettiati, Mauro
AU  - Jiménez López, Juan Ignacio
AU  - Cassidy, Daniel T.
PY  - 2020
SN  - 1089-7550
UR  - https://uvadoc.uva.es/handle/10324/49419
AB  - The mechanical deformation induced by reactive ion etching (RIE) of rectangular ridge waveguides in GaAs and InP has been investigated by photoluminescence and cathodoluminescence techniques. Several trends were identified and are discussed. First, it...
LA  - eng
PB  - AIP Publishing
KW  - Plasma processing
KW  - Procesamiento de plasma
KW  - Photonic materials
KW  - Materiales fotónicos
KW  - Photoluminescence
KW  - Fotoluminiscencia
KW  - Cathodoluminescence
KW  - Catodoluminiscencia
TI  - Mechanical stress in InP and GaAs ridges formed by reactive ion etching
DO  - 10.1063/5.0032838
ER  -