TY  - JOUR 
AU  - Kalam, Kristjan
AU  - Seemen, Helina
AU  - Ritslaid, Peeter
AU  - Rähn, Mihkel
AU  - Tamm, Aile
AU  - Kukli, Kaupo
AU  - Kasikov, Aarne
AU  - Link, Joosep
AU  - Stern, Raivo
AU  - Dueñas Carazo, Salvador
AU  - Castán Lanaspa, María Helena
AU  - García García, Héctor
PY  - 2018
SN  - 2190-4286
UR  - http://uvadoc.uva.es/handle/10324/44647
AB  - Thin solid films consisting of ZrO2 and Fe2O3 were grown by atomic layer deposition (ALD) at 400 °C. Metastable phases of ZrO2
were stabilized by Fe2O3 doping. The number of alternating ZrO2 and Fe2O3 deposition cycles were varied in order to...
LA  - eng
PB  - Beilstein-Institut
KW  - Atomic layer deposition
KW  - Deposición de capa atómica
KW  - Metal oxides
KW  - Óxidos metálicos
KW  - Thin films
KW  - Láminas delgadas
TI  - Atomic layer deposition and properties of ZrO2/Fe2O3 thin films
DO  - 10.3762/bjnano.9.14
ER  -