TY  - JOUR 
AU  - Kukli, Kaupo
AU  - Kemell, Marianna
AU  - Castán Lanaspa, María Helena
AU  - Dueñas Carazo, Salvador
AU  - Seemen, Helina
AU  - Rähn, Mihkel
AU  - Link, Joosep
AU  - Stern, Raivo
AU  - Heikkilä, Mikko J.
AU  - Ritala, Mikko
AU  - Leskelä, Markku
PY  - 2018
SN  - 2162-8777
UR  - http://uvadoc.uva.es/handle/10324/44922
AB  - Thin mixed and nanolaminate films of ZrO2 and Al2O3 were grown by atomic layer deposition from the corresponding metal chlorides and water. The films were grown at 350°C in order to ensure ZrO2 crystallization in the as-deposited state. The relative...
LA  - eng
PB  - IOP Publishing
KW  - Atomic layer deposition
KW  - Deposición atómica de capas
KW  - Thin films
KW  - Láminas delgadas
KW  - Metal oxides
KW  - Óxidos metálicos
TI  - Atomic layer deposition and performance of ZrO2-Al2O3 thin films
DO  - https://doi.org/10.1149/2.0021806jss
ER  -