TY  - JOUR 
AU  - Kahro, Tauno
AU  - Tarre, Aivar
AU  - Käämbre, Tanel
AU  - Piirsoo, Helle-Mai
AU  - Kozlova, Jekaterina
AU  - Ritslaid, Peeter
AU  - Kasikov, Aarne
AU  - Jõgiaas, Taivo
AU  - Vinuesa Sanz, Guillermo
AU  - Dueñas Carazo, Salvador
AU  - Castán Lanaspa, María Helena
AU  - Tamm, Aile
AU  - Kukli, Kaupo
PY  - 2021
SN  - 2574-0970
UR  - http://uvadoc.uva.es/handle/10324/46600
AB  - Thin HfO2 films were grown by atomic layer deposition on chemical vapor-deposited large-area graphene. The graphene was transferred, prior to the deposition of the HfO2 overlayer, to the HfO2 bottom dielectric layer pregrown on the Si/TiN substrate....
LA  - eng
PB  - ACS Publications
KW  - Graphene
KW  - Grafeno
KW  - Atomic layer deposition
KW  - Deposición atómica de capas
KW  - Hafnium oxide
KW  - Óxido de hafnio
KW  - Stacked nanostructures
KW  - Nanoestructuras apiladas
TI  - Hafnium oxide/graphene/hafnium oxide-stacked nanostructures as resistive switching media
DO  - 10.1021/acsanm.1c00587
ER  -