TY  - JOUR 
AU  - Kasikov, Aarne
AU  - Tarre, Aivar
AU  - Vinuesa, Guillermo
PY  - 2023
SN  - 1335-3632
UR  - https://uvadoc.uva.es/handle/10324/66161
AB  - Thin HfO2 films atomic layer deposited from hafnium alkyl amide and oxygen plasma were analysed using spectroscopic ellipsometry and X-ray reflectivity. Low refractive index of the material for samples with less than 30 nm thickness marks the index...
LA  - spa
PB  - Sciendo
KW  - hafnium thin films
KW  - spectroscopic ellipsometry
KW  - growth inhomogeneity
KW  - atomic layer deposition
KW  - packing density
KW  - resistive switching
KW  - filament formation
TI  - Inhomogeneous HfO2 layer growth at atomic layer deposition
DO  - 10.2478/jee-2023-0031
ER  -