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Defect formation during chlorine-based dry etching and their effects on the electronic and structural properties of InP/InAsP quantum wells	657

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JVSTA_34_041304_2016.pdf	683

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Defect formation during chlorine-based dry etching and their effects on the electronic and structural properties of InP/InAsP quantum wells	136

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JVSTA_34_041304_2016.pdf	49

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