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    Por favor, use este identificador para citar o enlazar este ítem:http://uvadoc.uva.es/handle/10324/44731

    Título
    Using current pulses to control the intermediate conductance states in hafnium oxide-based RRAM devices
    Autor
    García García, HéctorAutoridad UVA Orcid
    González Ossorio, ÓscarAutoridad UVA
    Dueñas Carazo, SalvadorAutoridad UVA Orcid
    Castán Lanaspa, María HelenaAutoridad UVA Orcid
    Congreso
    2020 IEEE Latin America Electron Devices Conference (LAEDC)
    Año del Documento
    2020
    Editorial
    IEEE Xplore
    Descripción Física
    4 p.
    Descripción
    Producción Científica
    Documento Fuente
    2020 IEEE Latin America Electron Devices Conference (LAEDC). San Jose, Costa Rica: IEEE Xplore, 2020
    Résumé
    Artificial synaptic devices used in neuromorphic systems need a high number of reachable conductance levels. Resistive switching devices are promising candidates to implement these devices due to their reachable conductance levels. In this work, we have used TiN/Ti/HfO 2 /W capacitors to study the control of the intermediate conductance states using current pulses instead of the usual voltage pulses. Unlike the use of voltage pulses, in this case we can control the HRS to LRS transition (potentiation characteristic). The characteristic is clearly linear when applying current pulses with linearly increasing amplitudes. The potentiation characteristic is not affected by the pulse length, even for lengths lower than 1 μs. In terms of peripheral circuitry, it is desirable to use pulses with identical amplitudes, but in this case no accumulative behavior is observed, and one current pulse is enough to carry the device to the final conductance state achieved for the amplitude used. Finally, it is not possible to control the HRS to LRS transition (depression characteristic) using current pulses due to the abrupt reset transition. However, this transition can be well controlled using voltage pulses.
    Palabras Clave
    Synaptic devices
    Dispositivos sinápticos
    Multilevel storage
    Almacenamiento multinivel
    Hafnium oxide
    Óxido de hafnio
    ISBN
    978-1-7281-1044-8
    DOI
    10.1109/LAEDC49063.2020.9073011
    Patrocinador
    Ministerio de Economía, Industria y Competitividad - Fondo Europeo de Desarrollo Regional (grant TEC2017-84321- C4-2-R)
    Version del Editor
    https://ieeexplore.ieee.org/document/9073011
    Propietario de los Derechos
    © 2020 IEEE Xplore
    Idioma
    eng
    URI
    http://uvadoc.uva.es/handle/10324/44731
    Tipo de versión
    info:eu-repo/semantics/publishedVersion
    Derechos
    openAccess
    Aparece en las colecciones
    • GCME - Comunicaciones a congresos, conferencias, etc. [12]
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    Using-current-pulses.pdf
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    Attribution-NonCommercial-NoDerivatives 4.0 InternacionalExcepté là où spécifié autrement, la license de ce document est décrite en tant que Attribution-NonCommercial-NoDerivatives 4.0 Internacional

    Universidad de Valladolid

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