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Título
Study of the admittance hysteresis cycles in TiN/Ti/HfO2/W-based RRAM devices
Autor
Año del Documento
2017
Editorial
ELSEVIER
Descripción
Producción Científica
Documento Fuente
Microelectronic Engineering, 2017, Vol. 178, p. 30-33
Resumen
Similarly to the current, the admittance of TiN/Ti/HfO2/W-based resistive memories shows well-defined minor switching loops associated with partial transitions between the ON and OFF states. Excellent control of the intermediate states is achieved in these samples by means of a proper sequence of input signals and current compliances. It is shown that, as the resistance state of the conductive filament changes, the associated susceptance also exhibits multilevel response. Susceptance values are negative in the ON state, indicating an inductive behavior of the conductive filaments.
Palabras Clave
RRAM devices
Admittance cycles
Hafnium oxide
Atomic layer deposition
ISSN
0167-9317
Revisión por pares
SI
Patrocinador
Ministry of Economy and Competitiveness and the FEDER program through projects TEC2014-52152-C3-3-R, TEC2014-52152-C3-1-R and TEC2014-54906-JIN
Idioma
spa
Tipo de versión
info:eu-repo/semantics/publishedVersion
Derechos
openAccess
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Ficheros en el ítem