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    Por favor, use este identificador para citar o enlazar este ítem:https://uvadoc.uva.es/handle/10324/65968

    Título
    Study of the admittance hysteresis cycles in TiN/Ti/HfO2/W-based RRAM devices
    Autor
    Dueñas Carazo, SalvadorAutoridad UVA Orcid
    Castán Lanaspa, María HelenaAutoridad UVA Orcid
    García García, HéctorAutoridad UVA Orcid
    Miranda, E.
    González, M.B.
    Campabadal, F.
    Año del Documento
    2017
    Editorial
    ELSEVIER
    Descripción
    Producción Científica
    Documento Fuente
    Microelectronic Engineering, 2017, Vol. 178, p. 30-33
    Résumé
    Similarly to the current, the admittance of TiN/Ti/HfO2/W-based resistive memories shows well-defined minor switching loops associated with partial transitions between the ON and OFF states. Excellent control of the intermediate states is achieved in these samples by means of a proper sequence of input signals and current compliances. It is shown that, as the resistance state of the conductive filament changes, the associated susceptance also exhibits multilevel response. Susceptance values are negative in the ON state, indicating an inductive behavior of the conductive filaments.
    Palabras Clave
    RRAM devices
    Admittance cycles
    Hafnium oxide
    Atomic layer deposition
    ISSN
    0167-9317
    Revisión por pares
    SI
    DOI
    10.1016/j.mee.2017.04.020
    Patrocinador
    Ministry of Economy and Competitiveness and the FEDER program through projects TEC2014-52152-C3-3-R, TEC2014-52152-C3-1-R and TEC2014-54906-JIN
    Version del Editor
    https://www.sciencedirect.com/science/article/pii/S0167931717301545?via%3Dihub
    Idioma
    spa
    URI
    https://uvadoc.uva.es/handle/10324/65968
    Tipo de versión
    info:eu-repo/semantics/publishedVersion
    Derechos
    openAccess
    Aparece en las colecciones
    • GCME - Artículos de revista [57]
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    1-s2.0-S0167931717301545-main.pdf
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    Attribution-NonCommercial-NoDerivatives 4.0 InternacionalExcepté là où spécifié autrement, la license de ce document est décrite en tant que Attribution-NonCommercial-NoDerivatives 4.0 Internacional

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