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Título
Experimental Observation of Negative Susceptance in HfO2-Based RRAM Devices
Autor
Año del Documento
2017
Editorial
Institute of Electrical and Electronics Engineers
Descripción
Producción Científica
Documento Fuente
IEEE Electron Device Letters, 2017, Vol. 38, n. 9, p. 1216-1219
Abstract
Negative susceptance is experimentally measured in the low resistance state of TiN/Ti/HfO 2 /W resistive RAM memories. A meminductive-like behavior appears along with the memristive effects. A detailed study of small-signal parameters measured at 0 V after applying positive and negative voltage pulses is presented. A simple model for the conductive filaments consisting in a resistance in series with an inductance is used. In the equivalent circuit, both elements are in parallel with the geometrical capacitance of the structure. Both resistance and inductance show two clearly differentiate states. Positive voltages switch the device to the ON state, in which the resistance value is low and the inductance value is high. By applying appropriate negative voltages, the device switches to the OFF state, in which resistance value is high and inductance becomes negligible. The negative susceptance could be related to lags between current and electric field due to transport mechanisms occurring in the ON state.
Palabras Clave
Hafnium oxide
meminductor
MIM capacitor
ISSN
0741-3106
Revisión por pares
SI
Version del Editor
Idioma
spa
Tipo de versión
info:eu-repo/semantics/publishedVersion
Derechos
openAccess
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