TY  - JOUR 
AU  - Kalam, Kristjan
AU  - Otsus, Markus
AU  - Kozlova, Jekaterina
AU  - Tarre, Aivar
AU  - Kasikov, Aarne
AU  - Rammula, Raul
AU  - Link, Joosep
AU  - Stern, Raivo
AU  - Vinuesa Sanz, Guillermo
AU  - Lendínez Sánchez, José Miguel
AU  - Dueñas Carazo, Salvador
AU  - Castán Lanaspa, María Helena
AU  - Tamm, Aile
AU  - Kukli, Kaupo
PY  - 2022
SN  - 2079-4991
UR  - https://uvadoc.uva.es/handle/10324/62051
AB  - HfO2 and Fe2O3 thin films and laminated stacks were grown by atomic layer deposition at 350 °C from hafnium tetrachloride, ferrocene, and ozone. Nonlinear, saturating, and hysteretic magnetization was recorded in the films. Magnetization was...
LA  - eng
PB  - MDPI
KW  - Thin films
KW  - Atomic layer deposition
KW  - Oxide
KW  - Hafnium
KW  - Iron oxides
KW  - Oxido ferroso
KW  - Nanoparticles
KW  - Nanoparticulas
KW  - Nanotechnology
KW  - Nanotecnología
KW  - Ferromagnetism
KW  - Magnetism
KW  - Magnetic materials
KW  - Materiales magnéticos
KW  - Resistive switching
KW  - Switching circuits
KW  - Circuitos eléctricos
KW  - Microelectronics
TI  - Memory effects in nanolaminates of hafnium and iron oxide films structured by atomic layer deposition
DO  - 10.3390/nano12152593
ER  -