TY  - JOUR 
AU  - Kukli, Kaupo
AU  - Aarik, Lauri
AU  - Vinuesa Sanz, Guillermo
AU  - Dueñas Carazo, Salvador
AU  - Castán Lanaspa, María Helena
AU  - García García, Héctor
AU  - Kasikov, Aarne
AU  - Ritslaid, Peeter
AU  - Piirsoo, Helle-Mai
AU  - Aarik, Jaan
PY  - 2022
SN  - 1996-1944
UR  - https://uvadoc.uva.es/handle/10324/63056
AB  - Crystal structure and electrical properties of hafnium-praseodymium oxide thin films grown by atomic layer deposition on ruthenium substrate electrodes were characterized and compared with those of undoped HfO2 films. The HfO2 reference films...
LA  - eng
PB  - MDPI
KW  - Atomic layer deposition
KW  - Crystals
KW  - Cristales - Estructura
KW  - Crystallography
KW  - Dielectrics
KW  - Dielectric properties
KW  - Electric resistors
KW  - Switching circuits
KW  - Electronics - Materials
KW  - Resistencias eléctricas
KW  - Circuitos eléctricos
KW  - Electricity
KW  - Materials science
KW  - Hafnium oxide
KW  - Óxido de hafnio
KW  - Praseodymium oxide
KW  - Óxido de praseodimio
TI  - Structure and electrical behavior of hafnium-praseodymium oxide thin films Grown by atomic layer deposition
DO  - 10.3390/ma15030877
ER  -