TY  - JOUR 
AU  - Kukli, Kaupo
AU  - Aarik, Lauri
AU  - Vinuesa, Guillermo
AU  - Dueñas, Salvador
AU  - Castán, Helena
AU  - García, Héctor
AU  - Kasikov, Aarne
AU  - Ritslaid, Peeter
AU  - Piirsoo, Helle-Mai
AU  - Aarik, Jaan
PY  - 2022
SN  - 1996-1944
UR  - https://uvadoc.uva.es/handle/10324/66146
AB  - Crystal structure and electrical properties of hafnium-praseodymium oxide thin films grown by atomic layer deposition on ruthenium substrate electrodes were characterized and compared with those of undoped HfO2 films. The HfO2 reference films...
LA  - spa
PB  - MDPI
KW  - hafnium oxide
KW  - praseodymium oxide
KW  - atomic layer deposition
KW  - crystal structure
KW  - dielectric properties
KW  - resistive switching
TI  - Structure and Electrical Behavior of Hafnium-Praseodymium Oxide Thin Films Grown by Atomic Layer Deposition
DO  - 10.3390/ma15030877
ER  -