Ver ítem 

Mostrar el registro sencillo del ítem

Título
Atomic layer deposition and properties of ZrO2/Fe2O3 thin films
dc.contributor.authorKalam, Kristjan
dc.contributor.authorSeemen, Helina
dc.contributor.authorRitslaid, Peeter
dc.contributor.authorRähn, Mihkel
dc.contributor.authorTamm, Aile
dc.contributor.authorKukli, Kaupo
dc.contributor.authorKasikov, Aarne
dc.contributor.authorLink, Joosep
dc.contributor.authorStern, Raivo
dc.contributor.authorDueñas Carazo, Salvador 
dc.contributor.authorCastán Lanaspa, María Helena 
dc.contributor.authorGarcía García, Héctor 
dc.date.accessioned2021-01-08T09:40:53Z
dc.date.available2021-01-08T09:40:53Z
dc.date.issued2018
dc.identifier.citationBeilstein Journal of Nanotechnology, 2018, vol. 9. p. 119-128es
dc.identifier.issn2190-4286es
dc.identifier.urihttp://uvadoc.uva.es/handle/10324/44647
dc.descriptionProducción Científicaes
dc.description.abstractThin solid films consisting of ZrO2 and Fe2O3 were grown by atomic layer deposition (ALD) at 400 °C. Metastable phases of ZrO2 were stabilized by Fe2O3 doping. The number of alternating ZrO2 and Fe2O3 deposition cycles were varied in order to achieve films with different cation ratios. The influence of annealing on the composition and structure of the thin films was investigated. Additionally, the influence of composition and structure on electrical and magnetic properties was studied. Several samples exhibited a measurable saturation magnetization and most of the samples exhibited a charge polarization. Both phenomena were observed in the sample with a Zr/Fe atomic ratio of 2.0.es
dc.format.mimetypeapplication/pdfes
dc.language.isoenges
dc.publisherBeilstein-Institutes
dc.rights.accessRightsinfo:eu-repo/semantics/openAccesses
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/*
dc.subject.classificationAtomic layer depositiones
dc.subject.classificationDeposición de capa atómicaes
dc.subject.classificationMetal oxideses
dc.subject.classificationÓxidos metálicoses
dc.subject.classificationThin filmses
dc.subject.classificationLáminas delgadases
dc.titleAtomic layer deposition and properties of ZrO2/Fe2O3 thin filmses
dc.typeinfo:eu-repo/semantics/articlees
dc.rights.holder© 2018 Beilstein-Institutes
dc.identifier.doi10.3762/bjnano.9.14es
dc.relation.publisherversionhttps://www.beilstein-journals.org/bjnano/articles/9/14es
dc.peerreviewedSIes
dc.description.projectFondo Europeo de Desarrollo Regional (project TK134)es
dc.description.projectMinisterio de Economía, Industria y Competitividad (grant TEC2014-52152-C3-3-R)es
dc.description.projectEstonian Research Agency (grants IUT2-24 and IUT23-7)es
dc.rightsAttribution-NonCommercial-NoDerivatives 4.0 Internacional*
dc.type.hasVersioninfo:eu-repo/semantics/publishedVersiones


Ficheros en el ítem

Thumbnail
Nombre:
Atomic-layer-deposition.pdf
Tamaño:
1.490Mb
Formato:
PDF
Visualizar/Abrir

Este ítem aparece en la(s) siguiente(s) colección(ones)

Mostrar el registro sencillo del ítem