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dc.contributor.authorVinuesa Sanz, Guillermo
dc.contributor.authorGarcía García, Héctor 
dc.contributor.authorLendínez Sánchez, José Miguel
dc.contributor.authorGarcía Ochoa, Eduardo
dc.contributor.authorGonzález, M. B.
dc.contributor.authorMaldonado, D
dc.contributor.authorAguilera Pedregosa, C
dc.contributor.authorMoreno, E
dc.contributor.authorJiménez Molinos, Francisco
dc.contributor.authorRoldán, J.B.
dc.contributor.authorCampabadal Segura, Francesca
dc.contributor.authorCastán Lanaspa, María Helena 
dc.contributor.authorDueñas Carazo, Salvador 
dc.date.accessioned2023-04-17T13:44:41Z
dc.date.available2023-04-17T13:44:41Z
dc.date.issued2023
dc.identifier.citationMicroelectronic Engineering, 2023, vol. 276, 112008es
dc.identifier.issn0167-9317es
dc.identifier.urihttps://uvadoc.uva.es/handle/10324/59155
dc.descriptionProducción Científicaes
dc.description.abstractIn this work, the unipolar resistive switching behaviour of Ni/HfO2/Si(n+) devices is studied. The structures are characterized using both current and voltage sweeps, with the device resistance and its cycle-to-cycle variability being analysed in each case. Experimental measurements indicate a clear improvement on resistance states stability when using current sweeps to induce both set and reset processes. Moreover, it has been found that using current to induce these transitions is more efficient than using voltage sweeps, as seen when analysing the device power consumption. The same results are obtained for devices with a Ni top electrode and a bilayer or pentalayer of HfO2/Al2O3 as dielectric. Finally, kinetic Monte Carlo and compact modelling simulation studies are performed to shed light on the experimental results.es
dc.format.mimetypeapplication/pdfes
dc.language.isoenges
dc.publisherElsevieres
dc.rights.accessRightsinfo:eu-repo/semantics/openAccesses
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/*
dc.subjectElectricidades
dc.subjectElectrónicaes
dc.subjectComputerses
dc.subject.classificationResistive switchinges
dc.subject.classificationHafnium oxidees
dc.subject.classificationCurrent controles
dc.subject.classificationRRAMes
dc.subject.classificationConmutación por resistenciaes
dc.subject.classificationÓxido de hafnioes
dc.subject.classificationControl de corrientees
dc.subject.classificationMemoria RAMes
dc.titleVariability and power enhancement of current controlled resistive switching deviceses
dc.typeinfo:eu-repo/semantics/articlees
dc.rights.holder© 2023 The Authorses
dc.identifier.doi10.1016/j.mee.2023.112008es
dc.relation.publisherversionhttps://www.sciencedirect.com/science/article/pii/S0167931723000734?via%3Dihubes
dc.identifier.publicationfirstpage112008es
dc.identifier.publicationtitleMicroelectronic Engineeringes
dc.peerreviewedSIes
dc.description.projectJunta de Andalucía - FEDER (B-TIC-624-UGR20)es
dc.description.projectConsejo Superior de Investigaciones Científicas (CSIC) (project 20225AT012)es
dc.description.projectRamón y Cajal (grant RYC2020-030150-I)es
dc.rightsAtribución 4.0 Internacional*
dc.type.hasVersioninfo:eu-repo/semantics/publishedVersiones
dc.subject.unesco3307 Tecnología Electrónicaes


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