Mostrar el registro sencillo del ítem

dc.contributor.authorDueñas Carazo, Salvador 
dc.contributor.authorCastán Lanaspa, María Helena 
dc.contributor.authorGonzález Ossorio, Óscar 
dc.contributor.authorDomínguez, L.A.
dc.contributor.authorGarcía García, Héctor 
dc.contributor.authorKalam, K.
dc.contributor.authorRitala, M.
dc.contributor.authorLeskelä, M.
dc.date.accessioned2024-02-08T11:27:59Z
dc.date.available2024-02-08T11:27:59Z
dc.date.issued2018
dc.identifier.citation2017 32nd Conference on Design of Circuits and Integrated Systems (DCIS), 2017, Barcelona, Spain, p. 1-4es
dc.identifier.isbn978-1-5386-5108-7es
dc.identifier.urihttps://uvadoc.uva.es/handle/10324/65996
dc.descriptionProducción Científicaes
dc.description.abstractThe resistive switching behavior of Ta 2 O 5 -ZrO 2 -based metal-insulator-metal devices was studied. Asymmetrical and repetitive current-voltage loops were observed. Excellent control of admittance parameters in the intermediate states between the high and low resistance ones was achieved, demonstrating suitability to analog and neuromorphic applications. Admittance memory cycles provide relevant information about the switching mechanism, in which the existence of two different metallic species in the dielectric seems to play an important role.es
dc.format.extent4 p.es
dc.format.mimetypeapplication/pdfes
dc.language.isoenges
dc.publisherInstitute of Electrical and Electronics Engineerses
dc.rights.accessRightsinfo:eu-repo/semantics/openAccesses
dc.subject.classificationResistive memorieses
dc.subject.classificationAdmittance memory cycleses
dc.subject.classificationTa2O5:ZrO2 ALD filmses
dc.titleAdmittance memory cycles of Ta2O5-ZrO2-based RRAM deviceses
dc.typeinfo:eu-repo/semantics/conferenceObjectes
dc.identifier.doi10.1109/DCIS.2017.8311627es
dc.relation.publisherversionhttps://ieeexplore.ieee.org/document/8311627/authors#authorses
dc.title.event2017 32nd Conference on Design of Circuits and Integrated Systems (DCIS)es
dc.description.projectThis study has been supported by the Spanish TEC2014 under Grant No. 52152-C3-3-R, and by Finnish Centre of Excellence in Atomic Layer Deposition (Academy of Finland, 284623) and Estonian Academy of Science (SLTFYUPROF)es
dc.type.hasVersioninfo:eu-repo/semantics/publishedVersiones


Ficheros en el ítem

Thumbnail

Este ítem aparece en la(s) siguiente(s) colección(ones)

Mostrar el registro sencillo del ítem