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dc.contributor.authorMarqués Cuesta, Luis Alberto 
dc.contributor.authorPelaz Montes, María Lourdes 
dc.contributor.authorSantos Tejido, Iván 
dc.contributor.authorLópez Martín, Pedro 
dc.contributor.authorDuffy, Ray
dc.date.accessioned2018-03-13T09:47:31Z
dc.date.available2018-03-13T09:47:31Z
dc.date.issued2012
dc.identifier.citationJournal of Applied Physics, 2012, 111, 034302es
dc.identifier.urihttp://uvadoc.uva.es/handle/10324/28965
dc.descriptionProducción Científicaes
dc.description.abstractWe use molecular dynamics (MD) simulation techniques to study the regrowth of nanometric multigate Si devices, such as fins and nanowires, surrounded by free surfaces and interfaces with amorphous material. Our results indicate that atoms in amorphous regions close to lateral free surfaces or interfaces rearrange at a slower rate compared to those in bulk due to the discontinuity of the lateral crystalline template. Consequently, the recrystallization front which advances faster in the device center than at the interfaces adopts new orientations. Regrowth then proceeds depending on the particular orientation of the new amorphous/crystal interfaces. In the particular case of 〈110〉 oriented fins, the new amorphous/crystal interfaces are aligned along the 〈111〉 direction, which produces frequent twining during further regrowth. Based on our simulation results, we propose alternatives to overcome this defected recrystallization in multigate structures: device orientation along 〈100〉 to prevent the formation of limiting {111} amorphous/crystal interfaces and presence of a crystalline seed along the device body to favor regrowth perpendicular to the lateral surfaces/interfaces rather than parallel to them.es
dc.format.mimetypeapplication/pdfes
dc.language.isoenges
dc.publisherAIP Publishinges
dc.rights.accessRightsinfo:eu-repo/semantics/openAccesses
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/
dc.subject.classificationMolecular dynamics simulationes
dc.subject.classificationSimulación de dinámica moleculares
dc.titleMolecular dynamics simulation of the regrowth of nanometric multigate Si deviceses
dc.typeinfo:eu-repo/semantics/articlees
dc.rights.holder© American Institute of Physicses
dc.identifier.doihttps://doi.org/10.1063/1.3679126es
dc.relation.publisherversionhttps://aip.scitation.org/doi/full/10.1063/1.3679126es
dc.peerreviewedSIes
dc.description.projectMinisterio de Economía, Industria y Competitividad (Project TEC2008-06069)es
dc.rightsAttribution-NonCommercial-NoDerivatives 4.0 International


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