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dc.contributor.author | Kahro, Tauno | |
dc.contributor.author | Castán Lanaspa, María Helena | |
dc.contributor.author | Dueñas Carazo, Salvador | |
dc.contributor.author | Merisalu, Joonas | |
dc.contributor.author | Kozlova, Jekaterina | |
dc.contributor.author | Jõgiaas, Taivo | |
dc.contributor.author | Piirsoo, Helle-Mai | |
dc.contributor.author | Kasikov, Aarne | |
dc.contributor.author | Ritslaid, Peeter | |
dc.contributor.author | Mändar, Hugo | |
dc.contributor.author | Tarre, Aivar | |
dc.contributor.author | Tamm, Aile | |
dc.contributor.author | Kukli, Kaupo | |
dc.date.accessioned | 2021-01-11T13:13:29Z | |
dc.date.available | 2021-01-11T13:13:29Z | |
dc.date.issued | 2020 | |
dc.identifier.citation | Journal of Vacuum Science & Technology A, 2020, vol. 38, n. 6. 10 p. | es |
dc.identifier.issn | 1520-8559 | es |
dc.identifier.uri | http://uvadoc.uva.es/handle/10324/44705 | |
dc.description | Producción Científica | es |
dc.description.abstract | ZrO2-graphene-ZrO2 layered structures were built and their crystallinity was characterized before resistive switching measurements. Thin nanocrystalline ZrO2 dielectric films were grown by atomic layer deposition on chemical vapor deposited graphene. Graphene was transferred, prior to the growth of the ZrO2 overlayer, to the ZrO2 film pre-grown on titanium nitride. Nucleation and growth of the top ZrO2 layer was improved after growing an amorphous Al2O3 interface layer on graphene at lowered temperatures. Studies on resistive switching in such structures revealed that the exploitation of graphene interlayers could modify the operational voltage ranges and somewhat increase the ratio between high and low resistance states. | es |
dc.format.mimetype | application/pdf | es |
dc.language.iso | eng | es |
dc.publisher | AIP Publishing | es |
dc.rights.accessRights | info:eu-repo/semantics/openAccess | es |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/4.0/ | * |
dc.subject.classification | Atomic layer deposition | es |
dc.subject.classification | Deposición atómica de capas | es |
dc.subject.classification | Nanomaterials | es |
dc.subject.classification | Nanomaterials | es |
dc.subject.classification | Thin films | es |
dc.subject.classification | Láminas delgadas | es |
dc.subject.classification | Graphene | es |
dc.subject.classification | Grafeno | es |
dc.title | Structure and behavior of ZrO2-graphene-ZrO2 stacks | es |
dc.type | info:eu-repo/semantics/article | es |
dc.rights.holder | © 2020 AIP Publishing | es |
dc.identifier.doi | 10.1116/6.0000390 | es |
dc.relation.publisherversion | https://avs.scitation.org/doi/10.1116/6.0000390 | es |
dc.peerreviewed | SI | es |
dc.description.project | Fondo Europeo de Desarrollo Regional (project TK134) | es |
dc.description.project | Estonian Research Agency (grants PRG753 and PRG4) | es |
dc.description.project | Ministerio de Economía, Industria y Competitividad (grant TEC2017-84321-C4-2-R) | es |
dc.rights | Attribution-NonCommercial-NoDerivatives 4.0 Internacional | * |
dc.type.hasVersion | info:eu-repo/semantics/publishedVersion | es |
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