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dc.contributor.author | Kalam, Kristjan | |
dc.contributor.author | Seemen, Helina | |
dc.contributor.author | Mikkor, Mats | |
dc.contributor.author | Jõgiaas, Taivo | |
dc.contributor.author | Ritslaid, Peeter | |
dc.contributor.author | Tamm, Aile | |
dc.contributor.author | Kukli, Kaupo | |
dc.contributor.author | Kasikov, Aarne | |
dc.contributor.author | Link, Joosep | |
dc.contributor.author | Stern, Raivo | |
dc.contributor.author | Dueñas Carazo, Salvador | |
dc.contributor.author | Castán Lanaspa, María Helena | |
dc.date.accessioned | 2021-02-01T09:39:32Z | |
dc.date.available | 2021-02-01T09:39:32Z | |
dc.date.issued | 2019 | |
dc.identifier.citation | Thin Solid Films Volume 669, 2019, Pages 294-300 | es |
dc.identifier.issn | 0040-6090 | es |
dc.identifier.uri | http://uvadoc.uva.es/handle/10324/45168 | |
dc.description | Producción Científica | es |
dc.description.abstract | Nanolaminates of ZrO2 and Co3O4 were atomic layer deposited on silicon and titanium nitride at 300 °C. Films were confirmed to be polycrystalline in the as-deposited state, with the cubic phase dominating in both oxides. All films exhibited resistive switching characteristics and charge polarization and ferromagnetic behavior. Also, the relative permittivities of the films were measured and the dispersion functions modelled. | es |
dc.format.mimetype | application/pdf | es |
dc.language.iso | eng | es |
dc.publisher | Elvier | es |
dc.rights.accessRights | info:eu-repo/semantics/openAccess | es |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/4.0/ | * |
dc.subject.classification | Óxido de cobalto | es |
dc.subject.classification | Cobalt oxide | es |
dc.title | Electrical and magnetic properties of atomic layer deposited cobalt oxide and zirconium oxide nanolaminates | es |
dc.type | info:eu-repo/semantics/article | es |
dc.rights.holder | © 2019 Elsevier | es |
dc.identifier.doi | 10.1016/j.tsf.2018.11.008 | es |
dc.relation.publisherversion | https://www.sciencedirect.com/science/article/pii/S0040609018307491 | es |
dc.identifier.publicationfirstpage | 294 | es |
dc.identifier.publicationlastpage | 300 | es |
dc.identifier.publicationtitle | Thin Solid Films | es |
dc.identifier.publicationvolume | 669 | es |
dc.peerreviewed | SI | es |
dc.description.project | Ministerio de Economía, Industria y Competitividad (TEC2017-84321-C4-2-R) | es |
dc.rights | Attribution-NonCommercial-NoDerivatives 4.0 Internacional | * |
dc.type.hasVersion | info:eu-repo/semantics/acceptedVersion | es |
dc.subject.unesco | 2202 Electromagnetismo | es |
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