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    Por favor, use este identificador para citar o enlazar este ítem:http://uvadoc.uva.es/handle/10324/45171

    Título
    Properties of atomic layer deposited iron oxide and bismuth oxide chloride structures
    Autor
    Seemen, Helina
    Kukli, Kaupo
    Jõgiaas, Taivo
    Ritslaid, Peeter
    Link, Joosep
    Stern, Raivo
    Dueñas Carazo, SalvadorAutoridad UVA Orcid
    Castán Lanaspa, María HelenaAutoridad UVA Orcid
    Tamm, Aile
    Año del Documento
    2020
    Editorial
    Elsevier
    Elsevier
    Descripción
    Producción Científica
    Documento Fuente
    Journal of Alloys and Compounds Volume 846, 2020, 156099
    Résumé
    Two-component crystalline thin film structures consisting of continuous ε-Fe2O3 bottom layers followed by top layers of BiOCl nanoflakes were grown using atomic layer deposition from FeCl3 and BiCl3 at 375 °C. Si(100) planar wafer, three-dimensional Si structures and conductive TiN/Si were exploited as substrates. Electrical measurements revealed that the deposited structures were moderately leaky, as the structures showed rectifying behavior affected by visible illumination. Magnetization in these films in the as-deposited state was nonlinear, saturative, and exhibited well-defined coercive fields. Annealing changed the surface morphology, phase composition and reduced the magnetic behavior of the thin films.
    ISSN
    0925-8388
    Revisión por pares
    SI
    DOI
    10.1016/j.jallcom.2020.156099
    Patrocinador
    Ministerio de Economía, Industria y Competitividad (TEC2017-84321-C4-2-R)
    Version del Editor
    https://www.sciencedirect.com/science/article/pii/S0925838820324634?dgcid=rss_sd_all
    Propietario de los Derechos
    © 2020 Elsevier
    Idioma
    eng
    URI
    http://uvadoc.uva.es/handle/10324/45171
    Tipo de versión
    info:eu-repo/semantics/acceptedVersion
    Derechos
    openAccess
    Aparece en las colecciones
    • GCME - Artículos de revista [57]
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    Revised_JALCOM-D-20-05860_Seemen.pdf
    Tamaño:
    2.488Mo
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    Attribution-NonCommercial-NoDerivatives 4.0 InternacionalExcepté là où spécifié autrement, la license de ce document est décrite en tant que Attribution-NonCommercial-NoDerivatives 4.0 Internacional

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