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Título
Properties of atomic layer deposited iron oxide and bismuth oxide chloride structures
Autor
Año del Documento
2020
Editorial
Elsevier
Elsevier
Descripción
Producción Científica
Documento Fuente
Journal of Alloys and Compounds Volume 846, 2020, 156099
Resumen
Two-component crystalline thin film structures consisting of continuous ε-Fe2O3 bottom layers followed by top layers of BiOCl nanoflakes were grown using atomic layer deposition from FeCl3 and BiCl3 at 375 °C. Si(100) planar wafer, three-dimensional Si structures and conductive TiN/Si were exploited as substrates. Electrical measurements revealed that the deposited structures were moderately leaky, as the structures showed rectifying behavior affected by visible illumination. Magnetization in these films in the as-deposited state was nonlinear, saturative, and exhibited well-defined coercive fields. Annealing changed the surface morphology, phase composition and reduced the magnetic behavior of the thin films.
ISSN
0925-8388
Revisión por pares
SI
Patrocinador
Ministerio de Economía, Industria y Competitividad (TEC2017-84321-C4-2-R)
Version del Editor
Propietario de los Derechos
© 2020 Elsevier
Idioma
eng
Tipo de versión
info:eu-repo/semantics/acceptedVersion
Derechos
openAccess
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