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    • PRODUZIONE SCIENTIFICA
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    • GCME - Capítulos de monografías
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    Por favor, use este identificador para citar o enlazar este ítem:https://uvadoc.uva.es/handle/10324/66228

    Título
    RRAM Memories with ALD High-K Dielectrics: Electrical Characterization and Analytical Modeling
    Autor
    Castán Lanaspa, María HelenaAutoridad UVA Orcid
    Dueñas Carazo, SalvadorAutoridad UVA Orcid
    Sardiña, A.
    García García, HéctorAutoridad UVA Orcid
    Arroval, T.
    Tamm, A.
    Jõgiaas, T.
    Kukli, K.
    Aarik, J.
    Año del Documento
    2017
    Editorial
    InetchOpen
    Descripción
    Producción Científica
    Documento Fuente
    2017 Thin Film Processes - Artifacts on Surface Phenomena and Technological Facets, Chapter 9
    Abstract
    Resistive switching phenomena with adequate repetitiveness on Ta2O5-TiO2-Ta2O5 and TiO2-Ta2O5-TiO2 stacks are reported. In particular, 5–nm-thick TiO2 films embedding a monolayer of Ta2O5 show the best behavior in terms of bipolar cycles loop width, with separate low and high resistive states up to two orders of magnitude. Tantalum oxide layer increases the defect density in titania that becomes less leaky, and thus, resistive switching effects appear. Small signal ac parameters measured at low and medium frequencies, namely capacitance and conductance, also show hysteretic behavior during a whole bipolar switching cycle. This means that the memory state can be read at 0 V, without any power consumption. High-frequency measurements provide information about dipole relaxation frequency values in the dielectric bulk, and this can be connected with resistive switching behavior. Finally, a double tunneling barrier model fits I-V curves at the low-resistance state even at the bias range where reset occurs and a sharp fall takes place.
    Palabras Clave
    resistive switching
    tantalum oxide
    titanium oxide
    RF impedance
    modeling
    ISBN
    978-953-51-3068-0
    Patrocinador
    Spanish Ministry of Economy and Competitiveness through project TEC2014-52152-C3-3-R, with support of Feder funds, Finnish Centre of Excellence in Atomic Layer Deposition, and Estonian Research Agency (PUT170, IUT2–24), and by the European Regional Development Fund projects TK134 “Emerging orders in quantum and nanomaterials” and TK141 “Advanced materials and high-technology devices for energy recuperation systems”. Authors would like to acknowledge Dr. M. B. González and Prof. F. Campabadal (IMB-CNM, Barcelona, Spain) for providing some samples of this study.
    Version del Editor
    https://www.intechopen.com/chapters/53337
    Idioma
    eng
    URI
    https://uvadoc.uva.es/handle/10324/66228
    Tipo de versión
    info:eu-repo/semantics/publishedVersion
    Derechos
    openAccess
    Aparece en las colecciones
    • GCME - Capítulos de monografías [2]
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    Universidad de Valladolid

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