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Atomic layer deposition and properties of HfO2-Al2O3 nanolaminates

Kukli, Kaupo; Kemell, Marianna; Castán Lanaspa, María Helena ; Dueñas Carazo, Salvador ; Seemen, Helina; Rähn, Mihkel; Link, Joosep; Stern, Raivo; Ritala, Mikko; Leskelä, Markku (2018)
Electric and magnetic properties of atomic layer deposited ZrO2-HfO2 thin films

Kalam, Kristjan; Seemen, Helina; Mikkor, Mats; Ritslaid, Peeter; Stern, Raivo; Dueñas Carazo, Salvador ; Castán Lanaspa, María Helena ; Tamm, Aile; Kukli, Kaupo (2018)
Properties of atomic layer deposited nanolaminates of zirconium and cobalt oxides

Seemen, Helina; Rähn, Mihkel; Kalam, Kristjan; Sajavaara, Timo; Dueñas Carazo, Salvador ; Castán Lanaspa, María Helena ; Link, Joosep; Stern, Raivo; Kukli, Kaupo; Tamm, Aile (2018)
Analysis and control of the intermediate memory states of RRAM devices by means of admittance parameters

Castán Lanaspa, María Helena ; Dueñas Carazo, Salvador ; García García, Héctor ; González Ossorio, Óscar ; Domínguez, Leidy Azucena; Sahelices Fernández, Benjamín ; Miranda, E.; Bargalló González, Mireia; Campabadal Segura, Francesca (2018)
Atomic layer deposition and properties of ZrO2/Fe2O3 thin films

Kalam, Kristjan; Seemen, Helina; Ritslaid, Peeter; Rähn, Mihkel; Tamm, Aile; Kukli, Kaupo; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Dueñas Carazo, Salvador ; Castán Lanaspa, María Helena ; García García, Héctor (2018)