dc.contributor.author | Castán Lanaspa, María Helena | |
dc.contributor.author | Dueñas Carazo, Salvador | |
dc.contributor.author | García García, Héctor | |
dc.contributor.author | González Ossorio, Óscar | |
dc.contributor.author | Domínguez, Leidy Azucena | |
dc.contributor.author | Sahelices Fernández, Benjamín | |
dc.contributor.author | Miranda, E. | |
dc.contributor.author | Bargalló González, Mireia | |
dc.contributor.author | Campabadal Segura, Francesca | |
dc.date.accessioned | 2021-01-08T10:09:50Z | |
dc.date.available | 2021-01-08T10:09:50Z | |
dc.date.issued | 2018 | |
dc.identifier.citation | Journal of Applied Physics, 2018, vol. 124, n. 15. 9 p. | es |
dc.identifier.issn | 1089-7550 | es |
dc.identifier.uri | http://uvadoc.uva.es/handle/10324/44651 | |
dc.description | Producción Científica | es |
dc.description.abstract | A thorough study of the admittance of TiN/Ti/HfO2/W bipolar resistive memories [resistance
random access memory (RRAM)] was carried out under different bias conditions and in a wide
range of ac signal frequencies. We demonstrate that a continuum of intermediate states can be
obtained by applying appropriate dc bias waveforms. Cumulative writing and erasing admittance
cycles were performed by applying triangular voltage waveform of increasing amplitude. The influence of the initial conditions on the variation of the real (conductance) and imaginary (susceptance)
components of the admittance is described. An accurate control of the memory state is achieved
both in terms of the conductance and the susceptance by means of an adequate selection of the
voltage values previously applied. A method to obtain three-dimensional voltage-conductance-susceptance state-plots is described in detail. Memory maps of admittance parameters as a function of
the programming voltage are made by sensing the memory state at 0 V, without static power consumption. The multilevel nature of RRAM devices and their suitability for neuromorphic computation are demonstrated. | es |
dc.format.mimetype | application/pdf | es |
dc.language.iso | eng | es |
dc.publisher | AIP Publishing | es |
dc.rights.accessRights | info:eu-repo/semantics/openAccess | es |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/4.0/ | * |
dc.subject.classification | Metal oxides | es |
dc.subject.classification | Óxidos metálicos | es |
dc.subject.classification | Dielectric properties | es |
dc.subject.classification | Propiedades dieléctricas | es |
dc.subject.classification | Thin films | es |
dc.subject.classification | Láminas delgadas | es |
dc.title | Analysis and control of the intermediate memory states of RRAM devices by means of admittance parameters | es |
dc.type | info:eu-repo/semantics/article | es |
dc.rights.holder | © 2018 AIP Publishing | es |
dc.identifier.doi | 10.1063/1.5024836 | es |
dc.relation.publisherversion | https://aip.scitation.org/doi/10.1063/1.5024836 | es |
dc.peerreviewed | SI | es |
dc.description.project | Ministerio de Economía, Industria y Competitividad - Fondo Europeo de Desarrollo Regional (grants TEC2014-52152-C3-3-R and TEC2014- 52152-C3-1-R) | es |
dc.rights | Attribution-NonCommercial-NoDerivatives 4.0 Internacional | * |
dc.type.hasVersion | info:eu-repo/semantics/publishedVersion | es |