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dc.contributor.author | Dueñas Carazo, Salvador | |
dc.contributor.author | Castán Lanaspa, María Helena | |
dc.contributor.author | García García, Héctor | |
dc.contributor.author | Miranda, E. | |
dc.contributor.author | González, M.B. | |
dc.contributor.author | Campabadal, F. | |
dc.date.accessioned | 2024-02-08T09:37:36Z | |
dc.date.available | 2024-02-08T09:37:36Z | |
dc.date.issued | 2017 | |
dc.identifier.citation | Microelectronic Engineering, 2017, Vol. 178, p. 30-33 | es |
dc.identifier.issn | 0167-9317 | es |
dc.identifier.uri | https://uvadoc.uva.es/handle/10324/65968 | |
dc.description | Producción Científica | es |
dc.description.abstract | Similarly to the current, the admittance of TiN/Ti/HfO2/W-based resistive memories shows well-defined minor switching loops associated with partial transitions between the ON and OFF states. Excellent control of the intermediate states is achieved in these samples by means of a proper sequence of input signals and current compliances. It is shown that, as the resistance state of the conductive filament changes, the associated susceptance also exhibits multilevel response. Susceptance values are negative in the ON state, indicating an inductive behavior of the conductive filaments. | es |
dc.format.mimetype | application/pdf | es |
dc.language.iso | spa | es |
dc.publisher | ELSEVIER | es |
dc.rights.accessRights | info:eu-repo/semantics/openAccess | es |
dc.subject.classification | RRAM devices | es |
dc.subject.classification | Admittance cycles | es |
dc.subject.classification | Hafnium oxide | es |
dc.subject.classification | Atomic layer deposition | es |
dc.title | Study of the admittance hysteresis cycles in TiN/Ti/HfO2/W-based RRAM devices | es |
dc.type | info:eu-repo/semantics/article | es |
dc.identifier.doi | 10.1016/j.mee.2017.04.020. | es |
dc.relation.publisherversion | https://www.sciencedirect.com/science/article/pii/S0167931717301545?via%3Dihub | es |
dc.identifier.publicationfirstpage | 30 | es |
dc.identifier.publicationlastpage | 33 | es |
dc.identifier.publicationtitle | Study of the admittance hysteresis cycles in TiN/Ti/HfO2/W-based RRAM devices | es |
dc.identifier.publicationvolume | 178 | es |
dc.peerreviewed | SI | es |
dc.description.project | Ministry of Economy and Competitiveness and the FEDER program through projects TEC2014-52152-C3-3-R, TEC2014-52152-C3-1-R and TEC2014-54906-JIN | es |
dc.type.hasVersion | info:eu-repo/semantics/publishedVersion | es |