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Author Castán Lanaspa, María Helena (13)Dueñas Carazo, Salvador (12)Kukli, Kaupo (9)Seemen, Helina (7)Tamm, Aile (6)... View More Date Issued

2018 (13)

Formato application/pdf (13)... View More

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SCIENTIFIC PRODUCTION
Grupos de Investigación
Grupo de Caracterización de Materiales y Dispositivos Electrónicos (GCME)
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UVaDOC Home
SCIENTIFIC PRODUCTION
Grupos de Investigación
Grupo de Caracterización de Materiales y Dispositivos Electrónicos (GCME)
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Electric and magnetic properties of atomic layer deposited ZrO2-HfO2 thin films

Kalam, Kristjan; Seemen, Helina; Mikkor, Mats; Ritslaid, Peeter; Stern, Raivo; Dueñas Carazo, Salvador

; Castán Lanaspa, María Helena

; Tamm, Aile; Kukli, Kaupo (2018)

Atomic layer deposition and properties of HfO2-Al2O3 nanolaminates

Kukli, Kaupo; Kemell, Marianna; Castán Lanaspa, María Helena

; Dueñas Carazo, Salvador

; Seemen, Helina; Rähn, Mihkel; Link, Joosep; Stern, Raivo; Ritala, Mikko; Leskelä, Markku (2018)

Atomic layer deposition and performance of ZrO2-Al2O3 thin films

Kukli, Kaupo; Kemell, Marianna; Castán Lanaspa, María Helena

; Dueñas Carazo, Salvador

; Seemen, Helina; Rähn, Mihkel; Link, Joosep; Stern, Raivo; Heikkilä, Mikko J.; Ritala, Mikko; Leskelä, Markku (2018)

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Universidad de Valladolid

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