Search

Now showing items 21-30 of 40

1
2
3
4

Electrical and magnetic properties of atomic layer deposited cobalt oxide and zirconium oxide nanolaminates

Kalam, Kristjan; Seemen, Helina; Mikkor, Mats; Jõgiaas, Taivo; Ritslaid, Peeter; Tamm, Aile; Kukli, Kaupo; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Dueñas Carazo, Salvador

; Castán Lanaspa, María Helena

(2019)

Multilevel HfO2-based RRAM devices for low-power neuromorphic networks

Milo, V.; Zambelli, Cristian; Olivo, P.; Pérez, Eduardo; Mahadevaiah, M. K.; González Ossorio, Óscar

; Wenger, Christian; Ielmini, Daniele (2019)

Control of the set and reset voltage polarity in anti-series and anti-parallel resistive switching structures

García García, Héctor

; Domínguez, Luis Antonio; Castán Lanaspa, María Helena

; Dueñas Carazo, Salvador

(2019)

Low-energy inference machine with multilevel HfO2 RRAM arrays

Milo, V.; Zambelli, Cristian; Olivo, P.; Pérez, Eduardo; González Ossorio, Óscar

; Wenger, Christian; Ielmini, Daniele (2019)

Effective reduction of the programing pulse width in Al: HfO2-based RRAM arrays

González Ossorio, Óscar

; Pérez, Eduardo; Dueñas Carazo, Salvador

; Castán Lanaspa, María Helena

; García García, Héctor

; Wenger, Christian (2019)

Controlling the intermediate conductance states in RRAM devices for synaptic applications

García García, Héctor

; González Ossorio, Óscar

; Dueñas Carazo, Salvador

; Castán Lanaspa, María Helena

(2019)

The role of defects in the resistive switching behavior of Ta2O5-TiO2-based metal–insulator–metal (MIM) devices for memory applications

Dueñas Carazo, Salvador

; Castán Lanaspa, María Helena

; García García, Héctor

; González Ossorio, Óscar

; Domínguez, Leidy Azucena; Seemen, Helina; Tamm, Aile; Kukli, Kaupo; Aarik, J. (2018)

Resistive switching properties of atomic layer deposited ZrO2-HfO2 thin films

González Ossorio, Óscar

; Dueñas Carazo, Salvador

; Castán Lanaspa, María Helena

; Tamm, Aile; Kalam, Kristjan; Seemen, Helina; Kukli, Kaupo (2018)

Atomic layer deposition and performance of ZrO2-Al2O3 thin films

Kukli, Kaupo; Kemell, Marianna; Castán Lanaspa, María Helena

; Dueñas Carazo, Salvador

; Seemen, Helina; Rähn, Mihkel; Link, Joosep; Stern, Raivo; Heikkilä, Mikko J.; Ritala, Mikko; Leskelä, Markku (2018)

Study of the influence of the dielectric composition of Al/Ti/ZrO2 : Al2O3/TiN/Si/Al structures on the resistive switching behavior for memory applications

Castán Lanaspa, María Helena

; Dueñas Carazo, Salvador

; Kukli, Kaupo; Kemell, Marianna; Ritala, Mikko; Leskelä, Markku (2018)

1
2
3
4