Sfoglia DEP22 - Artículos de revista per Data di Pubblicazione "2022"

Atomistic simulations of acceptor removal in p-type Si irradiated with neutrons

López Martín, Pedro

; Aboy Cebrián, María

; Muñoz Velasco, Irene; Santos Tejido, Iván

; Marqués Cuesta, Luis Alberto

; Fernández Martínez, Pablo; Ullán, Miguel; Pelaz Montes, María Lourdes

(2022)

Effect of dielectric thickness on resistive switching polarity in TiN/Ti/HfO2/Pt stacks

Vinuesa Sanz, Guillermo

; García García, Héctor

; Bargalló González, Mireia; Kalam, Kristjan; Zabala, Miguel; Tarre, Aivar; Kukli, Kaupo; Tamm, Aile; Campabadal Segura, Francesca; Jiménez López, Juan Ignacio

; Castán Lanaspa, María Helena

; Dueñas Carazo, Salvador

(2022)

Efficient and stable activation by microwave annealing of nanosheet silicon doped with phosphorus above its solubility limit

Tsai, Chun-Hsiung; Savant, Chandrashekhar P.; Asadi, Mohammad Javad; Lin, Yu-Ming; Santos Tejido, Iván

; Hsu, Yu-Hsiang; Kowalski, Jeffrey; Pelaz Montes, María Lourdes

; Woon, Wei-Yen; Lee, Chih-Kung; Hwang, James C. M. (2022)

Extending defect models for Si processing: The role of energy barriers for defect transformation, entropy and coalescence mechanism

Santos Tejido, Iván

; Caballo Zulueta, Ana; Aboy Cebrián, María

; Marqués Cuesta, Luis Alberto

; López Martín, Pedro

; Pelaz Montes, María Lourdes

(2022)

Memory effects in nanolaminates of hafnium and iron oxide films structured by atomic layer deposition

Kalam, Kristjan; Otsus, Markus; Kozlova, Jekaterina; Tarre, Aivar; Kasikov, Aarne; Rammula, Raul; Link, Joosep; Stern, Raivo; Vinuesa Sanz, Guillermo

; Lendínez Sánchez, José Miguel; Dueñas Carazo, Salvador

; Castán Lanaspa, María Helena

; Tamm, Aile; Kukli, Kaupo (2022)

Microscopic origin of the acceptor removal in neutron-irradiated Si detectors - An atomistic simulation study

López Martín, Pedro

; Aboy Cebrián, María

; Santos Tejido, Iván

; Marqués Cuesta, Luis Alberto

; Ullán, Miguel; Pelaz Montes, María Lourdes

(2022)

Rapid thermal process driven intra-die device variations

Tsai, Chinhao; Aboy Cebrián, María

; Pelaz Montes, María Lourdes

; Hsu, Yu-Hsiang; Woon, Wei-Yen; Timans, Paul J.; Lee, Chih-Kung (2022)

Structure and electrical behavior of hafnium-praseodymium oxide thin films grown by atomic layer deposition

Kukli, Kaupo; Aarik, Lauri; Vinuesa Sanz, Guillermo

; Dueñas Carazo, Salvador

; Castán Lanaspa, María Helena

; García García, Héctor

; Kasikov, Aarne; Ritslaid, Peeter; Piirsoo, Helle-Mai; Aarik, Jaan (2022)

Study of TiN/Ti/HfO2/W resistive switching devices: characterization and modeling of the set and reset transitions using an external capacitor discharge

García García, Héctor

; Jiménez Molinos, Francisco; Vinuesa Sanz, Guillermo

; Bargalló González, Mireia; Roldán, Juan B.; Miranda, Enrique; Campabadal Segura, Francesca; Castán Lanaspa, María Helena

; Dueñas Carazo, Salvador

(2022)

Thermal effects on TiN/Ti/HfO2/Pt memristors charge conduction

Jiménez-Molinos, F.; Tarre, A.; Tamm, A.; Kalam, K.; Kukli, K.; González, M. B.; Campabadal, F.; Roldán, J. B.; Dueñas Carazo, Salvador

; Castán Lanaspa, María Helena

; Vinuesa Sanz, Guillermo

; García García, Héctor

(2022)

Torsional chirality and molecular recognition: the homo and heterochiral dimers of thenyl and furfuryl alcohol

Juanes San José, Marcos

; Saragi, Rizalina Tama

; Pérez Cuadrado, Cristobal; Enríquez Giraudo, María Lourdes

; Jaraíz Maldonado, Martín

; Lesarri Gómez, Alberto Eugenio

(2022)

Understanding the color change of the solutions of Cp2TiCl upon addition of water

Thiessen, Tanner; Sidhu, Jaspreet; McIndoe, J. Scott; Rodríguez‐García, Ignacio; Rosales Martínez, Antonio; Jaraíz Maldonado, Martín

; Enríquez Giraudo, María Lourdes

; mcindoe (2022)

Sfoglia DEP22 - Artículos de revista per Data di Pubblicazione "2022"

Atomistic simulations of acceptor removal in p-type Si irradiated with neutrons ﻿

Effect of dielectric thickness on resistive switching polarity in TiN/Ti/HfO2/Pt stacks ﻿

Efficient and stable activation by microwave annealing of nanosheet silicon doped with phosphorus above its solubility limit ﻿

Extending defect models for Si processing: The role of energy barriers for defect transformation, entropy and coalescence mechanism ﻿

Memory effects in nanolaminates of hafnium and iron oxide films structured by atomic layer deposition ﻿

Microscopic origin of the acceptor removal in neutron-irradiated Si detectors - An atomistic simulation study ﻿

Rapid thermal process driven intra-die device variations ﻿

Structure and electrical behavior of hafnium-praseodymium oxide thin films grown by atomic layer deposition ﻿

Study of TiN/Ti/HfO2/W resistive switching devices: characterization and modeling of the set and reset transitions using an external capacitor discharge ﻿

Thermal effects on TiN/Ti/HfO2/Pt memristors charge conduction ﻿

Torsional chirality and molecular recognition: the homo and heterochiral dimers of thenyl and furfuryl alcohol ﻿

Understanding the color change of the solutions of Cp2TiCl upon addition of water ﻿

Atomistic simulations of acceptor removal in p-type Si irradiated with neutrons

Effect of dielectric thickness on resistive switching polarity in TiN/Ti/HfO2/Pt stacks

Efficient and stable activation by microwave annealing of nanosheet silicon doped with phosphorus above its solubility limit

Extending defect models for Si processing: The role of energy barriers for defect transformation, entropy and coalescence mechanism

Memory effects in nanolaminates of hafnium and iron oxide films structured by atomic layer deposition

Microscopic origin of the acceptor removal in neutron-irradiated Si detectors - An atomistic simulation study

Rapid thermal process driven intra-die device variations

Structure and electrical behavior of hafnium-praseodymium oxide thin films grown by atomic layer deposition

Study of TiN/Ti/HfO2/W resistive switching devices: characterization and modeling of the set and reset transitions using an external capacitor discharge

Thermal effects on TiN/Ti/HfO2/Pt memristors charge conduction

Torsional chirality and molecular recognition: the homo and heterochiral dimers of thenyl and furfuryl alcohol

Understanding the color change of the solutions of Cp2TiCl upon addition of water